Through Silicon Interconnect Using grayscale Lithography for MEMS Applications

Conference paper (2009)

Authors

Henk van Zeijl Electronic Components, Technology and Materials - EEMCS
D. Liu Electronic Components, Technology and Materials - EEMCS
Lina Sarro Electronic Components, Technology and Materials - EEMCS
Research Group
Electronic Components, Technology and Materials (EEMCS) (TU Delft)
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Published Date

2009

Language

Undefined/Unknown

Reuse Rights

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Components, Technology and Materials