Inductively coupled plasma etching of GaN and its effect ton electrical characteristics.

Journal article (2001)

Authors

B Rong QN/Kavli Nanolab Delft - AS
E.W.J.M. van der Drift QN/Kavli Nanolab Delft - AS
RJ Reeves External organisation
W.G. Sloof OLD Virtual Materials and Mechanics
R Cheung External organisation
Research Group
QN/Kavli Nanolab Delft (AS) (TU Delft)
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Published Date

2001

Language

Undefined/Unknown

Reuse Rights

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Faculty

Applied Sciences

Department

QN/Quantum Nanoscience

Research Group

QN/Kavli Nanolab Delft