Further investigation of hydrogen silsesquioxane e-beam resist as etching mask for cryogenic silicon etching

Conference paper (2008)

Authors

C. Yang Electronic Instrumentation - EEMCS
G. Pandraud Electronic Instrumentation - EEMCS
K Babaei Gavan QN/Mol. Electronics & Devices
EWJM van der Drift QN/Kavli Nanolab Delft - AS
P. J. French Electronic Instrumentation - EEMCS
Research Group
Electronic Instrumentation (EEMCS) (TU Delft)
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Published Date

2008

Language

Undefined/Unknown

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Faculty

Electrical Engineering, Mathematics and Computer Science

Department

Microelectronics

Research Group

Electronic Instrumentation