Further investigation of hydrogen silsesquioxane e-beam resist as etching mask for cryogenic silicon etching

Yang, C.; Pandraud, Gregory; Babaei Gavan, K; van der Drift, E.W.J.M.; French, Paddy

Further investigation of hydrogen silsesquioxane e-beam resist as etching mask for cryogenic silicon etching

Conference paper (2008)

Authors

C. Yang Electronic Instrumentation

Gregory Pandraud Electronic Instrumentation

K Babaei Gavan QN/Mol. Electronics & Devices

E.W.J.M. van der Drift QN/Kavli Nanolab Delft

Paddy French Electronic Instrumentation

Research Group

Electronic Instrumentation

Conference contrib. non-refer.

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Published Date

2008

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Research Group

Electronic Instrumentation

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