Extreme ultraviolet photoelectron spectroscopy on fluorinated monolayers

Towards nanolithography on monolayers

Journal article (2020)

Authors

Olivier Lugier Advanced Research Center for Nanolithography
Alessandro Troglia Advanced Research Center for Nanolithography
Najmeh Sadegh Advanced Research Center for Nanolithography
L.C.P.M. van Kessel ImPhys/Microscopy Instrumentation & Techniques - AS
Roland Bliem Advanced Research Center for Nanolithography, Vrije Universiteit Amsterdam
Nicola Mahne CNR-IOM, Trieste
Stefano Nannarone CNR-IOM, Trieste
Sonia Castellanos Advanced Research Center for Nanolithography
Research Group
ImPhys/Microscopy Instrumentation & Techniques (AS) (TU Delft)
Copyright: © 2020 Olivier Lugier, Alessandro Troglia, Najmeh Sadegh, L.C.P.M. van Kessel, Roland Bliem, Nicola Mahne, Stefano Nannarone, Sonia Castellanos
DOI: https://doi.org/10.2494/photopolymer.33.229
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Published Date

2020

Language

English

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Faculty

Applied Sciences

Department

ImPhys/Imaging Physics

Research Group

ImPhys/Microscopy Instrumentation & Techniques

Abstract

The semiconductor industry plans to keep fabricating integrated circuits, progressively decreasing there features size, by employing extreme ultraviolet lithography (EUVL). With this method, new designs and concepts for photoresist materials need to be conceived. In this work, we explore an alternative concept to the classic photoresist material by using an organic self-assembled monolayer (SAM) on a gold substrate. The monolayer, composed of a richly fluorinated thiol sensitive to low-energy electrons, is adsorbed on the Au substrate which acts as main EUV-absorber and as the source of photoelectrons and secondary electrons. We investigate the stability of the SAM adsorbed on gold towards EUV radiation by means of in-situ photoelectron spectroscopy. The photoelectron spectra indicate that the monolayer attenuates a significant amount of primary electrons generated in the gold layer. The spectral evolution upon EUV irradiation indicates that the SAM loses a significant amount of its initial fluorine content (ca. 40% at 200 mJ/cm2). We attribute these chemical changes mostly to the interaction with the electrons generated in the thiol/Au system.

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