High quality factor RF inductors using low loss conductor featured with skin effect suppression for standard CMOS/BiCMOS

Iramnaaz, I; Sandoval, T; Zhuang, Y; Schellevis, H.; Rejaei, B

High quality factor RF inductors using low loss conductor featured with skin effect suppression for standard CMOS/BiCMOS

Conference paper (2011)

Authors

I Iramnaaz External organisation

T Sandoval External organisation

Y Zhuang Old - EWI Ch. Integrated Sensing Devices

H. Schellevis Electronic Components, Technology and Materials

B Rejaei External organisation

Research Group

Old - EWI Ch. Integrated Sensing Devices

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Published Date

2011

Language

English

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Research Group

Old - EWI Ch. Integrated Sensing Devices

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