Print Email Facebook Twitter Effects of boron addition on the high temperature oxidation of MoSi2 alloys Title Effects of boron addition on the high temperature oxidation of MoSi2 alloys Author Ding, Z. (TU Delft Team Marcel Hermans) Brouwer, J.C. (TU Delft Team Marcel Hermans) Zhu, Jia-Ning (TU Delft Team Vera Popovich) Popovich, V. (TU Delft Team Vera Popovich) Hermans, M.J.M. (TU Delft Team Marcel Hermans) Sloof, W.G. (TU Delft Team Joris Dik) Date 2023 Abstract Boron containing MoSi2 is a promising material for applications at high temperature, but the oxidation mechanism is still unclear. In this work, the high temperature (1100 °C) oxidation of B doped MoSi2 in synthetic air has been investigated. A (boro)silicate layer is formed on the surface of the alloy, which features a mixture of amorphous SiO2 and cristobalite. After an initial transient period, the oxidation kinetics follows a parabolic growth rate law. The growth rate constant of the oxide layer is enhanced by the boron in the alloy by 90 % per at.% B. The increase in growth rate is associated with boron mitigating the formation of cristobalite thereby promoting the formation of amorphous SiO2. Subject BoronKineticsMoSiOxidation To reference this document use: http://resolver.tudelft.nl/uuid:fbfd83b7-291f-4cf0-b539-828ff3ce2af9 DOI https://doi.org/10.1016/j.scriptamat.2023.115580 ISSN 1359-6462 Source Scripta Materialia, 234 Part of collection Institutional Repository Document type journal article Rights © 2023 Z. Ding, J.C. Brouwer, Jia-Ning Zhu, V. Popovich, M.J.M. Hermans, W.G. Sloof Files PDF 1_s2.0_S1359646223003044_main.pdf 11.15 MB Close viewer /islandora/object/uuid:fbfd83b7-291f-4cf0-b539-828ff3ce2af9/datastream/OBJ/view